Czechoslovak Journal of Physics 
48 (1998), No. 10

Papers dedicated to Prof. Jan Janča
 
 O B S A H   •   C O N T E N T 
 
 
 P. LUKÁČ, V. KAPIČKA
Anniversary of Professor Jan Janča.  /1117/

P. KUBEŠ, S. PEKÁREK
Professor Janča’s anniversary – Personal account.  /1118/

P. ŠPANĚL, D. SMITH
The influence of gas and electron temperatures on electron attachment in gas electrical discharges.  /1119/

P. CICMAN, G. SENN, G. DENIFL, D. MUIGG, J.D. SKALNY, P. LUKAC, A. STAMATOVIC, T.D. MÄRK
Dissociative electron attachment to CO2.  /1135/

A.-M.POINTU, E. STAMATE, K. WIESEMANN
Principle and applications of a floating energy analyser.  /1147/

V.KAPIČKA, M.KLÍMA, R.VACULÍK, A.BRABLEC, P.SLAVÍČEK, M.STŘECHA , M.ŠÍCHA
The high pressure plasma source for the surface treatment technology based on the torch discharge stabilized by working gas flow.  /1161/

C.WILKE, H.DEUTSCH, A.DINKLAGE, H.SCHREIBNER
One-dimensional description of the anode region in a DC glow discharge.  /1167/

K.KUDU, I.H.LAGSTAD, R.S.SIGMOND
Positive point-to-plane corona discharge forms in O2-N2 mixtures.  /1180/

M.DORS, J.MIZERACZYK
Influence of temperature and humidity on NOx removal by corona discharge.  /1193/

K.V.KOZLOV, P.MICHEL, H.-E.WAGNER
Properties of the dielectric discharge in mixtures of methane with helium.  /1199/

J.MUSIL,  J.VLČEK
Magnetron sputtering of alloy-based films and its specifity.  /1209/

V.MARTIŠOVITŠ,  I.KOŠINÁR,  J.TRNOVEC,  M.ZAHORAN
In situ monitoring of uniformity by end point signal during plasma etching.  /1225/

J.GLOSÍK
Experimental study of the energy dependence of the reaction rate coefficients of the reaction CH3+ with N2O and NH3.  /1241/

A.RICARD,  T.BELMONTE,  S.BOCKEL,  H.MICHEL
Emission spectroscopy detection of N2 active species in plasma nitriding process.  /1253/

 

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