Electron Beam Lithography

The group of Electron Beam Lithography (EBL)  deals with the research and development in the field of microlithographic technologies using e-beam pattern generators. Its activity concentrates on large-size micro-structure diffractive optical elements for laser-beam forming, sub-micron diffractive holography structures for industrial holography applications, and thin-film metallic and dielectric structures on silicon substrates for biosensors and conductive chemical sensors. This research includes the development of off-line and on-line software enabling exposures of large-volume data, proximity effect handling, correction of deflection-field distortion, and modelling and simulation of generated structures that simplify the design cycle and enable parameter optimization.

Projects

 Members of the group participate in the following research projects:

• Development of in-situ techniques for characterization of materials and nanostructures
• Nonlinear diffraction fiber elements for sensor systems
• Technology of production and scanning of a machine-readable element of the highest level of security
• Development of innovative diffractive devices for advanced security of products, valuables and documents
• Centre of Advanced Electron and Photonic Optics

Publications

Publication results of the EBL group since 2010.

Selected result. We have contributed to the realization of an experimental system capturing an infinite order phase transition.
Artificial magnetic systems enable studying and probing of models of statistical mechanics, which are often inspired by natural compounds. In this study, we investigate the low-energy physics of the F model using a 2D magnetic lattice consisting of a connected square gird with circular holes at vertex points. By varying the diameter of the hole, which can be seen as a micromagnetic knob of the experimental simulator, one can probe different regimes of the investigated model. This strategy enabled us to experimentally approach the low-energy physics of the F model and to study its properties, including the infinite-order phase transition behaviour.

Analysis of the magnetic configurations in reciprocal space as a function of the hole diameter, diameter increasing from left to right. Selected as a cover image of the PRL (July issue).
Magnetic structure factors are calculated from the real space magnetic configurations measured on the lattices with different hole diameter. Each structure factor is computed as average of four configurations for given hole diameter. Intensity scale is the same in all six images.

Schánilec, V. - Brunn, O. - Horáček, M. - Krátký, S. - Meluzín, P. - Šikola, T. - Canals, B. - Rougemaille, N.
Approaching the Topological Low-Energy Physics of the F Model in a Two-Dimensional Magnetic Lattice.
Physical Review Letters. Vol. 129, No. 2 (2022), Paper no. 027202. ISSN 0031-9007. E-ISSN 1079-7114.

Links

PDF documents

• Profile of the EBL group
• Application sheets:
  • Automated Etching Device ARMIN
  • Micro & Nano Scales and Rulers
  • Microscopy Calibration Standards
  • Optical Applications Mastering
  • Diffractive Optically Variable Image Devices

Monograph (cz)

• F. Matějka, Praktická elektronová litografie, 2013.

Video presentation of the EBL group