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2008
2009
2010
4 captures
24 Feb 09 - 30 Oct 09
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Core facilities
Ultra-high vacuum AFM/STM and VariableTemperature-STM (30-1300 K)
Ambient AFM/STM combined incl. sub-pA current detection and other advanced regimes
Electrochemical AFM/STM incl. all advanced detection regimes
Micro-Raman and PL spectrometer with UV/VIS/NIR lasers
AFM-Raman spectrometer with 442 nm (blue) laser
Electrochemical analyzer (bi-potentiostat/galvanostat) incl. impedance module
Electronic device characterization (down to fA), as a function of temperature
Photoelectron spectrometer (XPS, UPS)
Fast Fourier Transform Infra Red spectrometer (FTIR)
Fourier Transform Photcurrent Spectroscopy (FTPS)
Hall effect and resistance measurements at low and high temperatures
Ellipsoidal cavity microwave plasma CVD reactor
Large area (20x30 cm) pulsed microwave plasma CVD reactor
Diamond boron doping process
Reactive ion etching (20 cm diameter)
Thermal evaporation of metals (Al, Ni, Au, Ti, ...)
Magnetron sputtering system and e-beam evaporation
Optical and electron-beam lithography
and more...
AFM-Raman micro-spectrometer
CVD diamond and nanotube reactor