Fyzikální ústav Akademie věd ČR

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Research at Department 25

Low-tremperature plasma diagnostics in technological devicesResearch subjects

In our laboratory, we use cold cylindrical Langmuir probe for precise spatial and temporal measurements of basic plasma parameters i.e. plasma potential, floating potential, plasma density and mean electron energy. Besides, we developed the calorimeter probe suitable for application in all the plasma systems. Since the calorimeter probe enables to...

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Development of thin film hierarchical nanosystems for microelectronisc and photovoltaicsResearch subjects

   The research deals with the design of the so-called hierarchic multi-layers systems with the assumed final functionality utilized for microelectronics and/or photovoltaics. The individual components of such organization will be ordinarily formed from thin layers with highly ordered nano-particles, which ensure a partial function...

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Low pressure deposition of perovskite thin filmsResearch subjects

At present time we are preparing a ferroelectrics thin films of BaxSr1-xTiO3 (BSTO) on a silicon substrate by a low pressure UHV plasma jet system with a hollow cathode and plasma jet channel.

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System for the deposition of perovskite layersSelected results

CZ 17135 U1 , Úřad průmyslového vlastnictví, Zápis užitného vzoru ze dne 8.1.2007 The system falls into the area of technological methods of deposition thin ferroelectric films with the aid of plasmochemical reactions. The system involves the design for realisation of deposition of perovskite layers, especially thin films' structures of the...

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System for the deposition of thin films at atmospheric pressureSelected results

CZ 17139 U1, Úřad průmyslového vlastnictví, Zápis užitného vzoru ze dne 8. ledna 2007. Solution comes under field of plasma-chemical multi-jet systems for realization of thin films deposition, in particular InxOy, SnOx and ZnO transparent conductive optical thin films (TCO), at atmospheric pressure.

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Measuring system for time-resolved laser absorption spectroscopy in the pulsed plasmaSelected results

CZ 19386 U1, Úřad průmyslového vlastnictví, Zápis užitného vzoru ze dne 2. března 2009. The technical solution is about description of a measuring system for time-resolved laser absorption spectroscopy in the pulsed plasma, which system is aimed particularly for use in basic research of plasma and plasma technologies.

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