- Home
- Main topics
- Publications
- Popularisation
- Contacts
Sputtering
Obrázky vážící se k technologii naprašování tenkých vrstev.
Cross-sectional transmission electron micrograph of a Mo/Si multilayer deposited in our laboratory
Submitted by iv on 8. February 2010 - 21:06
Článek:
Thin Layer Magnetron Sputtering ![Cross-sectional transmission electron micrograph of a Mo/Si multilayer deposited in our laboratory Cross-sectional transmission electron micrograph of a Mo/Si multilayer deposited in our laboratory](https://webarchiv.lib.cas.cz:443/wayback/20100501005512im_/http://ebt.isibrno.cz/sites/default/files/images/mosiresize.thumbnail.jpg)
Test of CrN layer on steel and test of TiN layer on WC and on steel
Submitted by iv on 7. February 2010 - 0:10Typical normal incidence x-ray refraction dependence of the Mo/Si mirror deposited in our laboratory
Submitted by iv on 7. February 2010 - 0:02![Special technologies: - mediaRSS Syndicate content](https://webarchiv.lib.cas.cz:443/wayback/20100501005512im_/http://ebt.isibrno.cz/misc/feed.png)
![RSS - Sputtering Syndicate content](https://webarchiv.lib.cas.cz:443/wayback/20100501005512im_/http://ebt.isibrno.cz/misc/feed.png)