Formation of nanosize (5–30 nm) dots of Fe, Cr, Ca, Mn and Mg silicides on Si(111)7x7 and Si(100)2x1 surfaces, silicon growth atop nanosize silicide dots and multilayer repetition of developed growth procedure for all silicides have been carried out in ultra-high vacuum chambers. Optimization of growth parameters has permitted to create monolithic multilayer nanoheterostructures (NHS) with buried nanocrystals (NCs) of Fe, Cr and Mn disilicides and polycrystalline NHS with buried Ca3Si4 and Mg2Si NCs or two-dimensional layers.
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