Thin layers and nano-characterization [J. Kočka, A. Fejfar]
The laboratory main aim is PECVD preparation of nanostructures and thin layers based on silicon, in particular with micro-crystalline and nano-crystalline structures (μc-Si:H, nc-Si:H). For optimization of properties their complete characterization is necessary on both macroscropic and nano levels through combined measurements of AFM. The perspective use of these materials is mainly for photovoltaic conversion of solar energy.
www: Thin Films and Nanostructures
www: Thin Films and Nanostructures 
