HV chamber equipped four magnetrons
(diameter of 4 inch of each) for preparation of multilayered structures,
DC, pulsed DC or RF magnetron power
in-situ spectral reflectometry and ellipsometry for measurement of thickness and refractive indices
Deposited materials: Ag, Al, Ta, Pd, SiO2, Ta2O5, Al2O3 , Si3N4
HV chamber for magnetron sputtering
pumped by an oil diffusion pump
magnetron target of 10 cm diameter
DC, pulsed DC or RF magnetron power up to 3 kW
Deposited materials: Al, Al2O3 , NiTi, NiTiOx, NiTiNx, Ti
Plasma enhanced chemical vapor deposition and ion reactive etching
