Fabrication of thin films of UV-Vis-NIR transparent dielectrics by repetitive, capillary-discharge XUV laser ablation
Pulsed laser deposition (PLD) is well introduced technique for preparation of thin films. However, it has
not been realized using a laser operating in the extremely ultraviolet (XUV) spectral range. Interaction of
XUV light with matter exhibits several features, which makes it much different in respect to the effect of
radiation incidence in ultraviolet, visible and infrared range. Photons of XUV radiation generated by
repetition capillary laser of energy 26.4 eV are absorbed in the matter mainly via photoeffect. The
bandgap width does not play any important role in the absorption of XUV radiation in the solid state
matter. This is a novel unique utilization of XUV for PLD preparation of thin film of materials
possessing negligible linear absorption in the UV-VIS-NIR spectral ranges, such as ionic crystals LiF,
CaF2, MgF2.
The part of this project is a comprehensive study of XUV laser plasma by means of optical
emission and mass spectroscopy and mathematical modeling of plasma behavior. Structural, optical and
fluorescence properties of the fabricated films will be analyzed.
