Seminar Tuesday, 06/05/2014 13:30 - 14:00
Speakers: Oleg Babchenko (Institute of Physics ASCR)
Place: Library, Institute of Physics ASCR, Cukrovarnická 10, Praha 6
Presented in Czech
Organisers:
Department of Optical Materials
The presentation will be devoted to the results of the research work that includes:
-
Investigation of the different nucleation strategies influence on diamond thin film growth using the microwave plasma assisted chemical vapour deposition (CVD) technique. In addition, study on the selective area diamond structures deposition, as related to previous;
-
Continuous and porous poly- and nano-crystalline diamond films growth in the two different types of deposition equipment. Including studies related to chemical composition and pressure (plasma volume) influence on diamond growth characterization;
-
Modification of diamond surface and diamond structures fabrication by plasma processing/etching for advanced studies;
-
Fabrication of catalytic nano-particles and carbon nano-tubes synthesising by CVD method in the focused plasma system;
-
Oriented carbon nano-tubes synthesising and influence of deposition parameters investigation in the system with linear plasma. Besides, carbon nano-tubes surface modification for advanced studies.
