Sponsor: Academy of Sciences of the Czech Republic
Principal ivestigator: Prof., Ing. Pavel Fiala, CSc.
Co-principal investigator: Jiří Zavadil, CSc.
Members: Ondřej Černohorský, MSc.; Miloslav Frühauf; Pavel Kacerovský, Ph.D.; František Kostka, Ph.D.; Vladimír Kuzmiak, Ph.D.; Jan Lorinčík, Ph.D.; Martin Müller, BSc.; Eva Novotná, MSc.; Jan Vaniš, Ph.D.; Roman Yatskiv, Ph.D.; Karel Žďánský, Ph.D.
From: 2008-01-01
To: 2010-12-31
The project proposes to concentrate on detailed study (modelling and experimental realization) of nanostructures, with target controlled dimensions from several nm and especially controlled organization on dimensions of tens to hundreds nm. The method of nanosphere lithography will be utilized, in combination with other methods as ion implantation, sputtering and deposition, electrolytic methods, iontophoresis, and sedimentation. The goal will be the preparation of both metallic (eg.Pd, Ni,Ag,Au), semiconducting (eg. Si,CdS,oxids-Fe,Zn), and possibly also dielectric nanostructures. Regulation of nanoparticle dimensions will be resolved using organic layers, micelar systems, growth stabilizers and chemical ablation. To characterize the nanostructures of interest, a wide range of methods will be used, including HRTEM, SEM, AFM, STM, etc. Given structures will be studied in various optical and optoelectronic applications, in connection with both passive and active structures.
