Fyzikální ústav Akademie věd ČR

Department of low-temperature plasma is focused namely on preparation of thin films by various plasma-chemical methods and on development of technological procedures which lead to the optimum growing of studied layers. Except for the classical magnetron sputtering, the low-pressure processes (namely hollow cathode discharge) and high-pressure processes working under atmospheric pressure (e.g. barrier torch discharge) are used. Detailed diagnostics of technological plasma is implemented in most of the experiments.