Fyzikální ústav Akademie věd ČR

Department of Low-Temperature Plasma

Vedoucí

Extension: 2995, 2415, 2456
Email: hubickaatfzu [dot] cz
Location: S
Room: O 218, SAFMAT 330, 329

Activities

Department of low-temperature plasma is focused namely on preparation of thin films by various plasma-chemical methods and on development of technological procedures which lead to the optimum growing of studied layers. Except for the classical magnetron sputtering, the low-pressure processes (namely hollow cathode discharge) and high-pressure processes working under atmospheric pressure (e.g. barrier torch discharge) are used. Detailed diagnostics of technological plasma is implemented in most of the experiments.

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