Fyzikální ústav Akademie věd ČR

Department of low-temperature plasma is focused namely on preparation of thin films by various plasma-chemical methods and on development of technological procedures which lead to the optimum growing of studied layers. Except for the classical magnetron sputtering, the low-pressure processes (namely hollow cathode discharge) and high-pressure processes working under atmospheric pressure (e.g. barrier torch discharge) are used. Detailed diagnostics of technological plasma is implemented in most of the experiments.


At present time we are co-investigator of international Hippocamp project (High-power Impulse Plasma Process Operations for the Creation of Advanced Metallic Parts). The project is focuses on a novel manufacturing process required to develop nanocomposites and use them as embedded reinforcements to improve the functional properties of products made of engineered metallic material such as structural components for automotive, aerospace, manufacturing and wind turbine applications. The Consortium of HIPPOCAMP project is formed by 10 partners from Finland, Sweden, Czech Republic, Italy, Germany and Spain. This project is funded by the European Commission under the Seventh Framework Programme.