Fyzikální ústav Akademie věd ČR

The group of plasma-chemical and chemical technologies

The group is focused on the research of deposition of thin films and nanostructures by combination of chemical methods (sol-gel, electrodeposition, anodization, etc.) and plasma methods. The goal are structures based on metal oxides (Co3O4 etc), for catalytic applications. The group leader is Ing. Petra Kšírová, Ph.D.

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