Fyzikální ústav Akademie věd ČR

Langmuir probe measurement of the bismuth plasma plume formed by a table-top extreme-ultraviolet pulsed laser

P. Pira1,2, T. Burian1,2, A. Kolpaková1, M. Tichý1, P. Kudrna1, S. Daniš1, L. Juha2, J. Lančok2, L Vyšín2, S. Civiš3, Z. Zelinger3, P Kubát3, J. Wild1

Properties of the plasma plume produced on a Bi target irradiated by a focused extreme-ultraviolet capillary-discharge laser beam were investigated. Langmuir probes were used to determine the electron temperature and the electron density, providing values of 1–3 eV and ~1013–1014 m−3, respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional lasers, the density is significantly lower.

Up: schematic illustration of diagnostic arrangement with single (a) or double (b) Langmuir probe; 1 – solid metallic (Bi) target irradiatd by focused XUV laser; 2 – plasma spurt, 3 – electric conductive probe in ceramic facing, 4 – voltage source, 5 – digital oscilloscope with its own probe, 6 – galvanically isolated ground, d – probe-target distance, R – 2,28 MΩ oscilloscope probe resistivity. Below: Electron densities (left) and temperatures (right) in different distances from the target determined using the single Langmuir probe in desorption bismuth plasma.

1Faculty of Mathematics and Physics, Charles University, V Holešovičkách 2, 180 00 Praha 8, Czech Republic
2Institute of Physics of the Academy of Sciences of the Czech Republic, vvi., Na Slovance 2, 182 21 Praha 8, Czech Republic
3J Heyrovský Institute of Physical Chemistry of the Academy of Sciences of the Czech Republic, v.v.i., Dolejškova 2155/3, 182 23 Praha 8, Czech Republic

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