Optical diffractive structures

The group of Electron Beam Lithography (EBL) within the Special technology department developed the E-beam lithography technology and Optical diffractive structures.

Bragg grating sensor prepared form the diffractive photomask is used for the monitoring of containment status.

DOVID master.

Diffractive zonal lens.

The resolution of the e-beam writer for the delineating of gratings with a period below 1 micron which is close to the visible light range (400–700 nm). With a relatively high writing speed, optical diffractive structures up to several inch squares can be prepared.

Due to the flexibility of the technology a variable set of diffraction gratings as well as their combination within one sample is possible e.g. reflection or transmission gratings, phase or amplitude gratings, regular (lines, crosses, circles) and irregular structures (Fournier, Fresnel), binary and multilevel profile and so on.

Application arreas:

• Phase diffractive optical elements (phase DOE’s) – methodology and technology of structure preparation.
• Industrial applications of EBL in the field of computer generated holograms (CGH), i.e. synthetic holograms patterned by the direct e beam writing process (groove by groove) as opposed to the laser interference method.
• Optical diffractive zonal lenses.

Selected R&D result used by industrial partner:

• Photomasks for UV exposure of Bragg gratings into the optical fiber core.
• Masters of diffractive optically variable image devices.
• Zonal structures applied in the area of lighting.
• Shaping of laser beam using computer generated holograms.

The group of Electron Beam Lithography

Research areas:

• EBL for Nanotechnologies
• Microlithography Techniques
• Nanolitography
• Industrial holography using e-beam lithography

Offered technologies:

• Optical diffractive structures
• E-beam lithography technology