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Research subjects at department 25

Low-tremperature plasma diagnostics in technological devices

In our laboratory, we use cold cylindrical Langmuir probe for precise spatial and temporal measurements of basic plasma parameters i.e. plasma potential, floating potential, plasma density and mean electron energy.

Besides, we developed the calorimeter probe suitable for application in all the plasma systems. Since the calorimeter probe enables to measure absolute value of the total energy flux density, this probe is utilized for measurements of energy conditions on the substrate during deposition process.

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Development of thin film hierarchical nanosystems for microelectronisc and photovoltaics

The research deals with the design of the so-called hierarchic multi-layers systems with the assumed final functionality utilized for microelectronics and/or photovoltaics.

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Low pressure deposition of perovskite thin films

At present time we are preparing a ferroelectrics thin films of BaxSr1-xTiO3 (BSTO) on a silicon substrate by a low pressure UHV plasma jet system with a hollow cathode and plasma jet channel.  The whole text »