Low-tremperature plasma diagnostics in technological devices

In our laboratory, we use cold cylindrical Langmuir probe for precise spatial and temporal measurements of basic plasma parameters i.e. plasma potential, floating potential, plasma density and mean electron energy.

Besides, we developed the calorimeter probe suitable for application in all the plasma systems. Since the calorimeter probe enables to measure absolute value of the total energy flux density, this probe is utilized for measurements of energy conditions on the substrate during deposition process.

Furthermore, the laser absorption spectroscopy system recently installed in our laboratory is used for measurement of absolute concentration and kinetic temperature of titanium atoms and argon metastable.
An knowledge of argon metastable concentration in the plasma bulk is important for determination of a position where particles comprising thin films are excited and where possibly the substrate should be placed.

Our laboratory is equipped with the retarding field energy analyzer used for measurement of the ion energy distribution functions at position of the substrate and for determination of the ion flux on the substrate.

UHV compatible Lagmuir probe with air cooling and RF compensation in the foreground. In the background is the aparatus for laser absorption spectroscopy.

Working group:
Mgr. Zdeněk Hubička, Ph.D
Mgr. Martin Čada, Ph.D
RNDr. Jiří Olejníček, Ph.D
Ing. Štěpán Kment
RNDr. Vítězslav Straňák, Ph.D
RNDr. Lubomír Jastrabík, CSc.
Mgr. Olexander Churpita