Thin layers deposited by magnetron sputtering and their dynamic impact testing
We can deposit thin layers by high-frequency magnetron sputtering in the commercial equipment LEYBOLD-HERAEUS Z 550, enabling the production of layers in small series or on single substrates of up to 100 mm in diameter and a thickness of 20 mm. The machine is equipped with three magnetrons, each with a Ø152 mm target. This makes it possible to deposit three different materials in one evacuation cycle. For special applications (for example ion etching) the substrate can be pre-heated and electrically charged.
Applications of magnetron sputtering:
- We can deposit multi-layers for X-ray optics, in combinations of double-layers such as molybdenum/silicon, nickel/carbon, scandium/silicon and others suitable for X-rays in the wavelength range from 12 to 50 nm. Maximum reflection at perpendicular impact is up to 70%.
- For very short wavelengths (less than 4 nm) multi-layer systems cannot be used because the roughness of the interface causes decreased reflectivity. Nevertheless, the periodical multi-layers are applicable for inclined rays, providing much higher reflexivity than much thicker mono-layer deposits.
- At present we are one of only two places in Czech Republic where characteristic properties of hard abrasion-resistant nano-composite and multi-layer deposits can be evaluated by a dynamic impact tester. During testing the sample surface is impacted periodically by a small wolfram-carbide ball, imitating a dynamic strain of layer/base system of stamping dies, cutting tools, parts of automobile motors, etc.
