The group of plasma deposition of thin films

The group is focused on the research of plasma deposition techniques for preparation of various types of thin films, multilayer structures and nanostructures. These are a new PVD and PECVD plasma methods such as multinozzle system of pulse hollow cathodes for fast reactive sputtering, pulsed reactive HIPIMS magnetron systems and microwave multinozzle PECVD plasma system with a surface wave. The main area of our interest are thin films based on semiconducting oxides (Fe2O3, TiO2, WO3) and semiconducting sulphide (FeS2, MoS2, etc.) intended for photocatalytic applications (solar water splitting, etc.). The group leader is RNDr. Jiří Olejníček, Ph.D.