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Semináře a workshopy oddělení 27

Low Temperature Chemistries for Atomic Layer Deposition Utilizing Hydrogen Peroxide Gas and Hydrazine Gas

Seminář / Čtvrtek, 11.10.2018 14:30

RASIRC is a division of Mitsubishi Chemical, a $50B chemical and gas company.  RASIRC is a small independent division that focuses on water vapor, hydrogen peroxide gas and hydrazine gas for atomic layer deposition and subsystem precision humidification.  We have developed the first commercial technology for delivery of hydrogen peroxide gas with minimal water vapor.  This can create ALD films that are not possible with water, ozone, or oxygen plasma.  Similarly, RASIRC has developed a proprietary formulation for delivery of hydrazine that is safer than straight hydrazine.  Our innovative...

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