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Seminars and workshops of department 27

Low Temperature Chemistries for Atomic Layer Deposition Utilizing Hydrogen Peroxide Gas and Hydrazine Gas

Seminář / Thursday, 11.10.2018 14:30

RASIRC is a division of Mitsubishi Chemical, a $50B chemical and gas company.  RASIRC is a small independent division that focuses on water vapor, hydrogen peroxide gas and hydrazine gas for atomic layer deposition and subsystem precision humidification.  We have developed the first commercial technology for delivery of hydrogen peroxide gas with minimal water vapor.  This can create ALD films that are not possible with water, ozone, or oxygen plasma.  Similarly, RASIRC has developed a proprietary formulation for delivery of hydrazine that is safer than straight hydrazine.  Our innovative...

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Prof. Chan Im Exciton Dynamics within Active Layers of Organic Bulk Heterojunction Solar Cells 27.04.2018 13:00
Dr. Pablo Aitor Postigo Nanophotonics at work: thresholdless micro lasers, nano-biomedical devices and quantum temperature sensors 27.04.2018 10:00
Dr. Philippe Veber Single crystal growth and characterization of lead-free piezoelectrics - Case of (BaxCa1-x)(TiyZr1-y)O3 solid solutions 24.04.2018 13:00
Dr. Philippe Veber Crystal growth of rare Earth sesquioxides for high power lasers and magneto-optical applications 18.04.2018 13:00
M. Haluška Individual single-walled carbon nanotubes for gas sensors: synthesis, localization, characterization and monitoring the device fabrication process 03.04.2018 13:00
Iaroslav Gerasymov Presentation of the Institute for Scintallation Materials in Charkov 15.11.2017 13:00
Dr. Marco Pizzichemi Positron Emission Tomography: state of the art and future developments 07.11.2017 13:00
Zdenek Remes, Yu Ying Chang, Neda Neykova The hydrogen plasma doping of ZnO thin films and nanoparticles 10.10.2017 13:00
Dr. Estelle Homeyer Contactless thermometry with luminescent microprobes 06.06.2017 13:30

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