Pyrolytic and photolytic approach or the deposition of novel Si/Ge/C materials.
Year from
2006
Year to
2008
Abstract:
The project will deal with the production of novel Si/Ge/C materials by means of laser CVD and ablative decomposition and spin-coating techniques. The goal of the project is i) preparation of Si/Ge/C films by several deposition techniques and ii) description and elucidation of the deposition processes and properties of the deposited Si/Ge/C films dependent on the starting silagermane precursor [HMe2SiGeMe3, HMe2SiCH2GeMe3, (CH2)3Ge(Me2HSi)2]or polymer containing Si and Ge, deposition conditions, temperature of the substrate and other experimental parameters. The project will introduce the novel up-to-date materials whose application is expected to be in micro- and optoelectronics.
The project will deal with the production of novel Si/Ge/C materials by means of laser CVD and ablative decomposition and spin-coating techniques. The goal of the project is i) preparation of Si/Ge/C films by several deposition techniques and ii) description and elucidation of the deposition processes and properties of the deposited Si/Ge/C films dependent on the starting silagermane precursor [HMe2SiGeMe3, HMe2SiCH2GeMe3, (CH2)3Ge(Me2HSi)2]or polymer containing Si and Ge, deposition conditions, temperature of the substrate and other experimental parameters. The project will introduce the novel up-to-date materials whose application is expected to be in micro- and optoelectronics.
RNDr. BASTL Zdeněk CSc.
Room
234, 207, 204
Department
Extension
3526, 3466, 3456
E-mail
zdenek.bastl
jh-inst.cas.cz
jh-inst.cas.cz
