Electron Beam Lithography
The group of Electron Beam Lithography (EBL) deals with the research and development in the field of microlithographic technologies using e-beam pattern generators. Its activity concentrates on large-size micro-structure diffractive optical elements for laser-beam forming, sub-micron diffractive holography structures for industrial holography applications, and thin-film metallic and dielectric structures on silicon substrates for biosensors and conductive chemical sensors. This research includes the development of off-line and on-line software enabling exposures of large-volume data, proximity effect handling, correction of deflection-field distortion, and modelling and simulation of generated structures that simplify the design cycle and enable parameter optimization.
PDF documents
- Profile pages of the EBL group, 4 pages:
- Handbook of the application capacities of the ISI:
