Photosynthetica, 2019 (vol. 57), issue 4

Photosynthetica 2019, 57(4):1165-1175 | DOI: 10.32615/ps.2019.099

Ecophysiological study of the impact of SiK® fertilization on Castanea sativa Mill. seedling tolerance to high temperature

A. CARNEIRO-CARVALHO1, R. ANJOS1, A. AIRES1, T. MARQUES2, T. PINTO1, J. GOMES-LARANJO1
Centre for the Research and Technology of Agro-Environmental and Biological Sciences (CITAB), University of Tras-os-Montes and Alto Douro (UTAD), Vila Real, Portugal1
University of Trás-os-Montes and Alto Douro (UTAD), Vila Real, Portugal2

The aim of this work was to evaluate the impact of Si fertilization on the resilience capacity of chestnut plants growing under high air temperatures and its recovery capacity after returning to optimal temperatures. Castanea sativa plants were supplied with 0, 5, 7.5, and 10 mM potassium silicate (SiK®) and exposed for a month at each temperature, 25, 32, and 25°C. The results demonstrated that phytoliths were accumulated in the leaf tissues, both on the cell wall and xylem vessels, suggesting their role in the plant's tolerance to heat. Under high temperature, Si fertilization in chestnut plants increased the gas exchange and the photochemical efficiency of the PSII as the increase of 50% on performance index suggests. The presence of Si also induced higher contents of photosynthetic pigments and promoted a better adaptation of chloroplasts to high temperatures. The present study suggests that the application of Si may be used to enhance the high temperature tolerance of chestnut plants.

Keywords: chloroplast activity; fluorescence transient; heat stress; lipids; silicon.

Received: March 20, 2019; Accepted: June 7, 2019; Prepublished online: October 31, 2019; Published: November 1, 2019Show citation

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CARNEIRO-CARVALHO, A., ANJOS, R., AIRES, A., MARQUES, T., PINTO, T., & GOMES-LARANJO, J. (2019). Ecophysiological study of the impact of SiK® fertilization on Castanea sativa Mill. seedling tolerance to high temperature. Photosynthetica, 57(4), 1165-1175. doi: 10.32615/ps.2019.099.
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