Power Supply
- D-C power supply CKD 2300 with fully controlled thyristor rectifier - 546 V, 1 000 A, transformer 315 kVA
- D-C power supply Skoda Plzen with fully controlled thyristor rectifier - 600 V, 600 A, transformer 400 kVA
- Choke 7 mH
Systems of Water Stabilized Plasma Torch WSP® and Hybrid Gas/Water Plasma Torch WSP®H
- 2 water supply units with regulation of input and output pressure and with automatic mnitoring of measured quantities
- Plasma torch WSP 500 with rotating anode and consumable cathode
- Plasma torch 160 kW with nozzle anode and fixed cathode
- Hybrid liquid-gas plasma torch 50 - 160 kW with rotating anode and fixed cathode
DC Arc Gas Plasma Torch Plasmatechnik with Plasma Gun F4 - Ar, N2, H2, He
DC Arc Gas Plasma Torches up to 50 kW - Ar, N2, H2
Reactor PLASGAS for Treatment of Waste and Biomass in Steam Plasma - 160 kW
- Computer control of operation
- Monitoring of operation
- Reaction gas diagnostics
Reactor for Low Pressure Thermal Plasma Jet Diagnostics (1 - 100 kPa)
- Fast Response measurements
- Digital oscilloscope Tektronix TDS420, 4 channels, max. sampling frequency 100 Ms/s, A/D 8 bit, 60 000 samples/channel
- Digital oscilloscope Tektronix TDS420, 4 channels, max. sampling frequency 100 Ms/s, A/D 8 bit, 120 000 samples/channel
- digital osciloscope LeCroy LT264M, 4 channels, 350 MHz, 1GS/s
- 2 transient recorders ELSY type TR410, 4 channels, max. sampling frequency 10 Ms/s, A/D 8 bit, 16 000 samples/channel
- Slow Response Measurements and Control of Experimental System
- 2 systems based on PLC Allen-Bradley SLC500, software RS Logix500. Vizualization using software RSView32 (Rockwell Automation).
- Control of water system, measurement and data acquisition of 8 temperatures, 3 pressures, 4 water flow rates, automatic evaluation of power balance
- Control of power supply, measurement and acquisition of electrical quantities
- Control and synchronisation of diagnostic measurements
Plasma Diagnostics
- OMA system with spectrograph Jobin Yvon with linear CCD
- Spectrograph Jobin Yvon with matrix CCD
- Schlieren system with pulsed Nd laser - exposure time 20 ns
- System of moving electric probes
- Enthalpy probe TEKNA
- Quadrupole mass spectrometer Balzers
- Short shutter camera Sensicam PCO Computer Optics, multiple exposure, exposure time 100 ns - 1 ms
- Short shutter camera Flashcam PCO Computer Optics, multiple exposure, exposure time 1 µs - 1ms
- Piezoelectric pressure probes Kistler
- Array of high-frequency photo-diodes (10 MHz)