Study of plasma formed in hybrid arrangement of pulsed laser decomposition.

Abstract:
The hybrid laser deposition method (H-PLD) of thin layers is a new deposition technology combined the pulsed laser deposition with applied discharges or sources of plasma (DC, RF, hollow cathode discharges, combination with magnetrone, etc.). The H-PLD method is already well-understood and provides thin layers with the required quality. However, the basic physical and chemical processes constituting the described process have not been fully elucidated. The goal is to employ spectroscopic methods to obtain basic information on the presence of reactive molecules in the H-PLD plasma and on the dynamics of propagating of the plasma plume at medium pressures (units to hundreds of Pa) and to further improve the method on the basis of the information obtained. The main target is a more detailed understanding of chemical and physical phenomena in the H-PLD process, monitoring of the formation of chemical intermediates and an attempt at detection.