Various wet chemistry methods allow us to deposit nanomaterials, nanostructures, and thin films with a given morphology, geometry, structure, and physical properties. The methods include chemical bath deposition, sol-gel, hydrothermal growth in an autoclave, dip-coating, spin coating, and electrophoretic deposition.
Equipment:
- flow reactor for chemical bath deposition with variable heating rate and flow rate of reactants;
- PPL-lined autoclave for hydrothermal growth;
- fully computer-controlled electrophoretic deposition cell using direct and time-varying electric fields;
- box with inert (nitrogen) atmosphere;
- cleanroom facility class 10000 with Herasafe KSP12 Class II/Type A2 Biological safety cabinet;
- tubular furnace for annealing in various atmospheres up to 1000 °C.
