Nízkoteplotní hybridní mikrovlnné plazmové zdroje s vysokým stupněm ionizace uspořádaných v matricové konfiguraci umožňujících depozice perspektivných materiálů a jejich (nano) kompozitů na 2D a 3D objekty

Main goal of the proposed project is design, development and realization of hybrid and fully modular microwave plasma assisted chemical vapor deposition system based on high-density cold-plasma generated by surfatron suitable for growth of novel and advanced materials and their (nano) composite forms such as oxides (TiO2, ZnO) or diamond. The main challenging part of the project is fulfilling several industrial aspects in one platform where requirements like implementation of 2D/3D geometrically shapedsubstrates, large area, low temperature growth, high reliability and reproducibility of whole plasma deposition process and long-term well defined process conditions will be combined. For this purpose, such plasma system either in radial or linear arrangement will be systematically studied by variety of analytic conditions as the function of process parameters (total pressure, gas mixture, plasma source geometry, etc.). The final deposition system will be the backbone for further industrial uses.