Abstract
The main objective of the project is to develop a new production technology of functional borane and carborane derivatives suitable for the preparation of nanolayers on semiconductive and metalline substrates and their use, in case of Si substrates, for doping. The new materials, utilizing monomolacular layers, will lead to a novel technology of shallow doping characteristic by significantly decreased consumption of the starting borane compounds. The aim of the project will be a semi-plant technology proces for the production of semiconducting substrates based on boron implantation by laser. These materials will be used in fotovoltaics.