The main area of my scientific activity is focused on the research and development of thin film deposition systems with planar magnetrons, plasma jets and microwave surfatrons. Another key area is the diagnostics of low-temperature discharge, mainly in technological plasma during thin film deposition using a time-resolved Langmuir probe, a Sobolewski probe measuring ion flux on a substrate, a retarding field energy analyser and a modified Katsumata probe. Furthermore, I am interested in measuring the energy flux on a substrate using a calorimetric probe. I am also interested in time-resolved mass and energy spectroscopy of ions or neutrals, as well as time-resolved optical emission spectroscopy of low-temperature plasma.
Recently, I have been intensively involved in the development and optimization of a PEALD system with microwave surfatron for the deposition of very thin barrier layers based on TiO2 or Al2O3 materials. Furthermore, I deal with hollow cathode plasma jet systems, which are used for the efficient deposition of catalysts based on the spinel structure of transition metal oxides for the thermal decomposition of volatile organic compounds (VOC). Another interesting application topic I am focusing on is the study of a hybrid HiPIMS system based on controlled ignition of the cathodic arc during the pulse of HiPIMS discharge, the so-called HiPIMS+Arc. The aim is to develop a deposition technology for the preparation of ta-C with high hardness and low roughness, which is currently unattainable with current deposition technologies. A new research topic of my group is the preparation of high-entropy disulfide alloys by reactive magnetron sputtering to find a low-temperature technology for the preparation of 2D materials suitable for highly active catalytic reactions.
